E-beam writer Raith EBPG 5200

Description

This equipment makes it possible to react an electrosensitive resin to an electron beam and thus to produce patterns of a dimension less than 10nm.

Manufacturer and model

Raith EBPG 5200

Technical specifications

• Fast moving stage
• 1 mm writing field
• Minimum feature size 5 nm
• Overlay error < 10 nm
• 10 cassettes load lock
• 200 mm substrate
• 100 kV system @ 125 Mhz