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Plasma Etcher Oxford Cobra III-V

Oxford plasma etchers

Description 

III-V compounds and heterostructures etching

Manufacturer and model

Oxford Instruments - Plasma Pro 100-D Cobra 300

Technical specifications 

  • Electrode temperature : --150°C to 400°C
  • ICP Source : Up 3kW at 2MHz
  • Plate source : Up to 600W at 13,56MHz
  • Gas installed on the system : Ar, O2, N2, H2, SF6, SiCl4, BCl2, CH4, HBr
  • Sample size : up to 200mm
  • Optical spectrometer (end point) : no

Examples of available processes

  • Etching of III-V, Ge, GaN materials
  • Atomic Layer Etching (ALE)