High precision mask aligner

Description

The MJB4 mask aligner is a precision instrument for high precision photolithography. It has been designed to expose standard wafers / substrates as well as irregularly shaped substrates with max. 100 mm or 4 x 4 and various thicknesses.

Manufacturer and model

Süss MicroTec MJB4

Technical specifications

Precision mask aligner with possibility of UV and DUV exposure from the front, for small samples and substrates up to 4 inches in diameter.

Examples of available processes

Manufacture of various devices by photolithography requiring a very precise alignment from one photolithography level to another (eg <1um of precision).