High precision mask aligner
The MJB4 mask aligner is a precision instrument for high precision photolithography. It has been designed to expose standard wafers / substrates as well as irregularly shaped substrates with max. 100 mm or 4 x 4 and various thicknesses.
Manufacturer and model
Süss MicroTec MJB4
Precision mask aligner with possibility of UV and DUV exposure from the front, for small samples and substrates up to 4 inches in diameter.
Examples of available processes
Manufacture of various devices by photolithography requiring a very precise alignment from one photolithography level to another (eg <1um of precision).