Prime Oven

Description

Surface preparation of substrates or samples for dehydration photolithography followed by vapor primer and adhesion promoter pumping cycles.

Manufacturer & model

YES LP III

Technical specifications

• Microprocessor controlled
• MicroMaster Logic Sequencer, Fuji Electric Temperature Controller
• Treatment chamber of 11.5 x 11.5 x 19.5
• Capacity up to 12 cassettes of substrates of 100mm diameter (or 6 of 150mm)
• Maximum temperature 300 ° C
• HMDS bottle included
• Stability at temperature +/- 2%
• Primary vacuum obtained by Edwards mechanical pump
• Granville-Phillips Pressure Gauge

Examples of available processes

• Standard 5-minute program of HMDS steam primer at 150 ° C after dewatering cycles with pumping and purging to optimize the adhesion of photoresists to common substrates.
• Short programs of 1 minute and 10 seconds also available for less demanding applications.