High precision mask aligner

Description

The MJB4 mask aligner is a precision instrument for high precision photolithography. It has been designed to expose standard wafers / substrates as well as irregularly shaped substrates with max. 100 mm or 4 x 4 and various thicknesses.

Manufacturer & model

Süss MicroTec MJB4

Technical specifications

Precision mask aligner with possibility of UV and DUV exposure from the front, for small samples and substrates up to 4 inches in diameter.

Examples of available processes

Manufacture of various devices by photolithography requiring a very precise alignment from one photolithography level to another (eg <1um of precision).