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Deposition System Angstrom Quantum

Angstrom Quantum

Description

Superconducting materials deposition, sputtering and evaporation.

Manufacturer & Model

Angstrom-Quantum series

Technical specifications

  • A three-chamber deposition cluster with a sputtering, an evaporation and an oxidation chamber
  • Automated sample transfer across all chambers under vaccum
  • Base pressure < 5x10-9 Torr
  • The sputtering and evaporation chambers feature a sample heating up to 800°C and rotation
  • The evaporation chamber has sample tilt capability for liftoff JJ process
  • Can accommodate samples holders up to 200 mm wafer
  • This is a superconducting materials dedicated deposition tool, carrying Nb, Ta, Ti, and Al.

Exemples of available processes

  • Sputtering chamber : there are four targets inside the tool, and three different power sources for each. Targets can be operated using, a HIPIMS, DC-pulsed, or an RF power source.
  • The oxidation chamber allows, dynamic and static oxidation processes. And it has a turbo pump.
  • Evaporation chamber; the shadow evaporation lift-off process for Josephson junction fabrication is a great example that uses the tilt and rotation tool specifications

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