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Angstrom Nebula Deposition System

Description

Thin film deposition system using electron gun and cathode sputtering

Manufacturer & model

Angstrom-Nebula

Technical specifications

  • Maximum substrate size: coupon, substrate 200 mm or less, compatible with the use of small samples
  • Materials available :
    • evaporation: Al, Au, Cr, Ge, Ni (to come) Pt, Ti. Carousel with 6 crucibles allowing multilayer deposits to be made without having to break the vacuum.
    • sputtering: Ti, Al, ITO, TiN a magnetron in RF and a magnetron in pulsed DC.
  • In-situ cleaning and ion beam assistance.
  • Gases available for reactive spraying and ion beams: Ar, N2, O2.
  • Rotating sample holder, heating up to 600°C

Example of available processes

  • Surface metallizations
  • Deposition of metallic multilayers for producing ohmic contacts on semiconductors and heterostructures