Wet benches

General purpose wet benches

Description

All chemical treatments requiring the use of liquid chemicals (cleaning, engraving, surface treatments, nitrogen jet drying, etc.)

8 wet benches available.

Manufacturer

Canadian cabinet

Wet benches dedicated to development

Description

Wet benches dedicated to the manual development of resins by immersion or automated development.

3 benches available including 1 automated.

Manufacturer & model

SIC - WB-423061

Technical specifications

• Work surface with extraction including a sink equipped with a faucet and a deionized water spray as well as a nitrogen gun.
• Located in yellow room for use with photosensitive resins.
• Bench #2 equipped with a Polos ADC development device in solid natural polypropylene which allows automated development of photosensitive resins.
• For ADC Polos only:
  • Substrates with diameters up to 200mm (8in) or substrates up to 7in x 7in
  • Speed ​​range of 0-8000 rpm
  • Up to 50 programs, up to 99 steps per program
  • Program-controlled valves controlling the injection of nitrogen, water and developers
  • Step duration, speed, acceleration, and programmable valve activation

Examples of available processes

• Development of photosensitive resins (basic developers) by immersion.
• Development of electron-sensitive resins (solvents) by immersion.
• Cleaning samples, masks or accessories.
• Preparation of solutions or resin.
• For the bench equipped with Polos ADC: spraying of developers such as MF319 and AZ400K and possibility of using other types of developers. Automated development of photosensitive resins including sample rinsing and drying.