Samples cleaning by oxygen plasma
Manufacturer and model
Tegal Corporation - Plasmaline 415
- Room style "barrel etcher"
- RF source 0 to 300W at 13.56 MHz
- Maximum substrate diameter 6 "
- Compatible with the use of small samples
Examples of available processes
- Cleaning before etching
- Cleaning before metallic deposition
- Removal of organic residues (resins, etc.)
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