Samples cleaning by oxygen plasma

Manufacturer and model

Tegal Corporation - Plasmaline 415 

Technical specifications
  •  Room style "barrel etcher"
  • RF source 0 to 300W at 13.56 MHz
  • Maximum substrate diameter 6 "
  • Compatible with the use of small samples
Examples of available processes
  • Cleaning before etching
  • Cleaning before metallic deposition
  • Removal of organic residues (resins, etc.)

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