Prime Oven

Description

Surface preparation of substrates or samples for dehydration photolithography followed by vapor primer and adhesion promoter pumping cycles.

Manufacturer and model

YES LP III

Technical specifications
  • Microprocessor controlled
  • MicroMaster Logic Sequencer, Fuji Electric Temperature Controller
  • Treatment chamber of 11.5 "x 11.5" x 19.5 "
  • Capacity up to 12 cassettes of substrates of 100mm diameter (or 6 of 150mm)
  • Maximum temperature 300 ° C
  • HMDS bottle included
  • Stability at temperature +/- 2%
  • Primary vacuum obtained by Edwards mechanical pump
  • Granville-Phillips Pressure Gauge
Examples of available processes
  • Standard 5-minute program of HMDS steam primer at 150 ° C after dewatering cycles with pumping and purging to optimize the adhesion of photoresists to common substrates.
  • Short programs of 1 minute and 10 seconds also available for less demanding applications.

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