Microscope Zeiss Leo 1540 XB

Description

Scanning electron microscopy. High-resolution electron beam lithography. Scanning Transmission Electron Microscopy (STEM).

Manufacturer and model

Zeiss - Nano Technology Systems Division - 1540XB CrossBeam Workstation

Technical specifications

  • Acceleration voltage: from 100 V to 30 kV, adjustable in steps of 10V
  • Probe size from 1nm to 20 kV, 2.5 nm to 1 kV
  • Beam current: 4 pA to 20 nA
  • Magnification: from 20 X to 950 kX
  • Source of e-: Schottky field effect filament
  • Sample carrier
  • 6-axis motorized displacement super-eucentric
  • Displacement of sample:

    •   X: 100 mm motorized
    •   Y: 100 mm motorized
    •   Z: 60 mm motorized
    •   Z ': 10 mm motorized
    •   rotation: 360 ° motorized
    •   inclination: -10 ° to 60 ° motorized

  • Detectors:

    •  secondary electrons (for the electron beam and the ion beam)
    •  intra-column ("in-lens")
    •  STEM detector

  • Electrolithography software compatible with files of several types, such as DesignCad, Autocad (.dxf), GDSii, CIF
Accessories
  • PC-controlled Raith "beam blanker" using NPGS 4 MHz electrolithography software
Examples of available processes
  • Lithography by ultra high resolution electron beam (better than 20 nm in the PMMA resin)
  • Observations in scanning electron microscopy

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