Microscope Zeiss Leo 1540 XB

Description

Scanning electron microscopy. High-resolution electron beam lithography. Scanning Transmission Electron Microscopy (STEM).

Manufacturer and model

Zeiss - Nano Technology Systems Division - 1540XB CrossBeam Workstation

Technical specifications

• Acceleration voltage: from 100 V to 30 kV, adjustable in steps of 10V
• Probe size from 1nm to 20 kV, 2.5 nm to 1 kV
• Beam current: 4 pA to 20 nA
• Magnification: from 20 X to 950 kX
• Source of e-: Schottky field effect filament
• Sample carrier
• 6-axis motorized displacement super-eucentric

Displacement of sample

•   X: 100 mm motorized
•   Y: 100 mm motorized
•   Z: 60 mm motorized
•   Z ': 10 mm motorized
•   rotation: 360 ° motorized
•   inclination: -10 ° to 60 ° motorized

Detectors

•  secondary electrons (for the electron beam and the ion beam)
•  intra-column (in-lens)
•  STEM detector
• Electrolithography software compatible with files of several types, such as DesignCad, Autocad (.dxf), GDSii, CIF

Accessories

• PC-controlled Raith beam blanker using NPGS 4 MHz electrolithography software

Examples of available processes

• Lithography by ultra high resolution electron beam (better than 20 nm in the PMMA resin)
• Observations in scanning electron microscopy